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Beilstein J. Nanotechnol. 2012, 3, 817–823, doi:10.3762/bjnano.3.91
Figure 1: (a) AFM topographic images depicting a series of oxide protrusions produced by applying various vol...
Figure 2: AFM topography image of the final structure.
Figure 3: (a) Isometric view of the simulated device. (b) Blow up view of the gated area and different nanowi...
Figure 4: (a) SEM image of the gated area. (b) Experimental measurement and simulated transfer characteristic...
Figure 5: Hole concentration for a vertical cut of DGJLT at (X = −100 nm) for four different gate voltages (a...
Figure 6: (a) Hole density and (b) electron density distribution as a function of position along a horizontal...
Figure 7: Simulated (a) parallel and (b) normal electric field along a horizontal cut line at the center of t...